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Built in Panorama stitching/Exposure blending

Implemented

Kommentare

3 Kommentare

  • Offizieller Kommentar
    Lily

     

    Hi Giovanni,

     

    Thank you for feedback on Capture One - this is always welcomed and encouraged among our users and we appreciate the time you've taken to contribute towards the development of the software.

    I have forwarded your comments and suggestions to our Product Management team as something to consider in a future release.

    Whilst we cannot comment on future releases, we take all suggestions on board and hopefully your feedback contributes towards a future version of Capture One.

  • M Hains

    It is a feature I really need. Even if there was a plug in to allow use of another program like Microsoft ICE or PTGui.

    The number 1 reason why I still use LR for panoramas and C1 for everything else.

    1
  • Andrew

    I actually switched back to using Lightroom exclusively because of this. I've been doing a lot of stitching using a technical camera, and swapping back and forth between the two packages was rather annoying, so I just ditched Capture One for now.

    2

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